Laboratory of Microscopy and Nanomechanical Measurements
Atomic Force Microscope Agilent 5500
Measurements AFM/STM in the air, any atmosphere, liquids with variable sample temperature (–20 to 200°C). Static and dynamic measurements, mapping surface properties (electrical, mechanical, magnetic), electrochemical cell, surface potential. Scan size up to 90 micrometers. Subnanometer resolution of x, y, z movements and cantilever deflection.
Nanoindenter Agilent G200
Determination of mechanical properties (modulus of elasticity, friction, hardness) of many materials. Offers the option of sample temperature variation from room temperature to 250°C. Mapping of mechanical properties and possible surface scanning before and after test. Scratch tests. Standard measurement head: maximum force 500 mN, force resolution 50 nN, dis-placement resolution 0.01 nm; DCMII head: maximum force 30 mN, force resolution 3 nN, displacement resolution 0.0002 nm.
Nanotensile Agilent T150
This apparatus permits tensile testing of natural, plastic or metallic fibres. Very high measurement precision allows testing single fibres (e.g. spider silk). Maximum force 500 mN, force resolution 50 nN, displacement resolution 0.01 nm, maximum extension 200 mm.
Scanning electron microscope with analytic FEI Quanta 250 FEG
High resolution FEG-SEM with ESEM end STEM technology. Characterisation of conductive and non-conductive samples with SE and BSE imaging possible in every mode of operation. Resolution in high vacuum 0.8 nm at 30 kV (STEM), 1.0 nm at 30 kV (SE), 3.0 nm at 1 kV (SE); low vacuum 1.4 nm at 30 kV (SE), 3.0 nm at 3 kV (SE); extended vacuum mode (ESEM) 1.4 nm at 30 kV (SE). Analytical equipment: EDS, WDS, EBSD detectors (EDAX): allow determination of sample composition and crystallographic orientation. Possible mapping. Preparation equipment: Leica EM TXP automatic trimmer, Q150T ES Combined Sputtering and Carbon Coating System.
Laser Scanning Microscope Olympus LEXT OLS4100
Non-contact 3D observations and measurements of surface features at 10 nanometer resolutions for height scale. It also features a fast image acquisition and a high-resolution image over a wide area. Light Source: 405 nm Semiconductor Laser, Total magnification 108× – 17,280×.
High-Performance Laser Scanning Microscope Olympus FV1200
Two GaAsP detectors, live cell imaging experiments, implementing real time Z-drift compensation and touch panel control. Confocal observation of fixed samples, with up to 5 simultaneous fluorescent detection channels, lasers: 405 nm, 458/488/515 nm, 559 nm, 635 nm.
Polarising light microscope Olympus BX-52
High quality polarizing microscope permits identification of isotropic and anisotropic materials, forensic analysis, thin film/polymer/crystal and extraneous particulates identification. Reflected/Transmitted light. Camera and measurements software. Objectives up to 100×.
Laboratory of nanotechnology (Clean Room)
Deposition of layers and layer systems and their structuring using methods of optical and electron lithography. Preparation of arbitrary metallic structures in the nanometric scale.
Scanning electron microscope with focused ion beam FEI Helios NanoLab 660
Extremely high resolution (XHR), with subnanometer resolution from 500 V to 30 kV, sharp and charge free contrast obtained from up to 6 integrated in-column and below the lens detectors. Fast and precise milling and deposition with critical dimensions of less than 10 nm. Schottky thermal field emitter. Gas injection system (Pt deposition, carbon mill, insulator deposition). EDX analytics.
Ion etching and metals deposition MicroSystems IonSys 500
Ion beam milling and ion beam deposition (Al). Sample size up to 150 mm diameter.
Optical maskless lithography Durham Magneto Optics MicroWriter ML
It is a flexible photolithography machine designed for rapid prototyping and small volume manufacture in R&D laboratories and small clean rooms. Resolution 600 nm. 1 mm – 200 mm sample size. Up to 180 mm/minute writing speed. 405 nm exposure wavelength.
Equipment for the application processes and resists baking and chemical etching of samples. Sawatec SM-180 spin coater, Sawatec HP-200 hotplate ultrasonic bath.